Abstract 

Colloidal quantum dots (QDs) are leading candidates for next-generation optoelectronics owing to their tuneable bandgaps, narrow emission linewidths, and high luminescence quantum yields. For virtual-, augmented-, and mixed-reality display applications of these materials, patterning full-color QDs at μm-length scales is essential. However, existing photolithographic approaches often degrade QD luminance characteristics by exposing them to harsh processing conditions, or they compromise the structural fidelity of the resulting patterns. Here we report a photoresist-guided indirect (PIN) photopatterning strategy that includes (i) lithographic formation of sacrificial PR patterns, (ii) deposition of a crosslinked QD film on top, and (iii) PR stripping that removes the sacrificial PR, leaving behind crosslinked QD patterns on the substrate. QD crosslinking is mediated by a diazo-based ligand thermocrosslinker, Diazo-4-LiXer. Leveraging low-temperature (110–120 °C)-activated carbene chemistry, Diazo-4-LiXer bridges neighbouring QDs while maintaining their intrinsic photoluminescence and electroluminescence through repeated processing. Moreover, Diazo-4-LiXer enables thermocrosslinking without affecting the underlying photoresist pre-patterns, which serve as structural templates determining the thickness and fidelity of the QD patterns. Using PIN photopatterning, we realize high-fidelity RGB patterns exceeding 4,000 pixels per inch resolution and demonstrate integration-level scalability by fabricating a 10 × 10 passive-matrix full-colour RGB QD–LED array. 

Researchers, affiliated with UNIST have announced a significant advancement in quantum dot (QD) display technology, enabling ultra-fine, high-resolution patterning of QDs suitable for next-generation XR glasses. This innovation promises brighter, more vivid images even in outdoor environments. 

Professor BongSoo Kim from the Department of Chemistry at UNIST, in collaboration with Professor Moon Sung Kang of Sogang University and Dr. Chan-mo Kang at Electronics and Telecommunications Research Institute (ETRI), have developed a novel photopatterning technique that maintains the integrity of quantum dots while achieving micron-scale precision. 

To meet the demanding resolution required for XR displays—exceeding 3,000 pixels per inch (PPI)—the team’s method patterns quantum dots into 2-micrometer (μm) pixels. This enables over 4,000 PPI, meaning more than 10 million pixels can be packed into a space about the size of a coin, ensuring sharp, immersive visuals. 

The process employs a custom-developed additive, Diazo-4-LiXer, which facilitates thermocrosslinking at low temperatures (110–120°C) via carbene chemistry, preserving the quantum dots’ luminescent properties. It involves creating a sacrificial photoresist (PR) template, depositing a crosslinked quantum dot film, then removing the PR to leave behind precisely patterned quantum dots—without damage or shape distortion. 

This technique not only achieves high fidelity and density but also enables the fabrication of full-color RGB quantum dot LED arrays, demonstrating its potential for commercial application. 

Professor Kim commented, “Our method allows for ultra-high resolution patterning of quantum dots while maintaining their exceptional optical properties. It opens new avenues for advanced XR glasses and microdisplays, where brightness, color purity, and resolution are crucial.” 

The findings of this research have been published in Nature Communications on March 19, 2026. The study has been supported by the Samsung Research Funding & Incubation Center of Samsung Electronics, the National Research Foundation of Korea (NRF), and the Ministry of Science and ICT (MSIT).

Journal Reference

Hyeokjun Kim, Hyobin Ham, Chang Hyeok Lim, et al., "Photoresist-guided indirect photopatterning of quantum dots via carbene-mediated ligand thermocrosslinking," Nat. Commun., (2026).